Research progress of silicon nanostructures prepared by electrochemical etching based on galvanic cells

Abstract Metal-assisted etching of silicon in HF aqueous solution has attracted widespread attention due to its potential applications electronics, photonics, renewable energy, and biotechnology. In this paper, the basic process mechanism metal assisted electrochemical vapor or liquid atmosphere based on galvanic cells are reviewed. This paper focuses use gas-phase oxidants O 2 H instead phase Fe(NO 3 ) catalyze solution. The substrate enhanced metal-assisted chemical for preparation large-area micro nanostructure arrays is summarized, impact type surface area reactive discussed.